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Comparison of tantalum nitride films for different NH3/H2/Ar reactant states in two-step atomic layer deposition
Bibliographic Information
- Other Title
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- Comparison of tantalum nitride films for different NH3 H2 Ar reactant states in two step atomic layer deposition
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Description
資料形態 : テキストデータ プレーンテキスト
コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
Journal
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 48 (2), 025504-, 2009-02
Tokyo : The Japan Society of Applied Physics