Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions

Details 詳細情報について

• CRID

  1520290882619508992

• NII Article ID

  40019394868

• NII Book ID

  AA12295836

• ISSN

  00214922

• NDL BIB ID

  023907032

• Web Site

  http://id.ndl.go.jp/bib/023907032

  https://ndlsearch.ndl.go.jp/books/R000000004-I023907032

• Text Lang

  en

• NDL Source Classification

  • ZM35(科学技術--物理学)

• Data Source

  • NDL
  • CiNii Articles