Invited Fabrication of Sub-100nm Linewidth Grating Patterns Using Nanoimprint Lithography
Bibliographic Information
- Other Title
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- Invited Fabrication of Sub 100nm Linewidth Grating Patterns Using Nanoimprint Lithography
- 2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices(AWAD 2004) ; Session A8 Nano-Lithography
- 2004 Asia Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices AWAD 2004 ; Session A8 Nano Lithography
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Journal
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- 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
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電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 104 (154), 9-12, 2004-07-02
東京 : 電子情報通信学会
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Details 詳細情報について
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- CRID
- 1520290882683222016
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- NII Article ID
- 110003175622
- 110003309193
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- NII Book ID
- AA1123312X
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- ISSN
- 09135685
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- Text Lang
- en
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- NDL Source Classification
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- ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
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- Data Source
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- NDL
- CiNii Articles