Modification of semianalytical finite element model for radio frequency sheaths in single- and dual-frequency capacitively coupled plasmas (2) Effects of nonuniform bulk plasma density and charging at dielectric surface

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Modification of semianalytical finite element model for radio frequency sheaths in single and dual frequency capacitively coupled plasmas 2 Effects of nonuniform bulk plasma density and charging at dielectric surface

Japanese journal of applied physics : JJAP

Japanese journal of applied physics : JJAP 50 (3), 036001-, 2011-03

Tokyo : The Japan Society of Applied Physics