Molecular dynamics simulation of chemical vapor deposition of amorphous carbon: dependence on H/C ratio of source gas
書誌事項
- タイトル別名
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- Molecular dynamics simulation of chemical vapor deposition of amorphous carbon dependence on H C ratio of source gas
- Special issue: Advanced plasma science and its applications for nitrides and nanomaterials
- Special issue Advanced plasma science and its applications for nitrides and nanomaterials
この論文をさがす
収録刊行物
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 50 (1), 2011-01
Tokyo : The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1520290883403492096
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- NII論文ID
- 40017446864
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- NII書誌ID
- AA12295836
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- ISSN
- 00214922
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- NDL書誌ID
- 10947409
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- 本文言語コード
- en
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- NDL 雑誌分類
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- ZM35(科学技術--物理学)
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- データソース種別
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- NDL
- CiNii Articles