Room Temperature Growth of Al-Doped ZnO Thin Films by Reactive DC Sputtering Technique with Metallic Target
Bibliographic Information
- Other Title
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- Special Issue : Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Journal
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 52 (1), 2013-01
Tokyo : The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1520290883415134976
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- NII Article ID
- 40019557406
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- NII Book ID
- AA12295836
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- ISSN
- 00214922
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- NDL BIB ID
- 024217819
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- Text Lang
- en
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- NDL Source Classification
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- ZM35(科学技術--物理学)
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- Data Source
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- NDL
- CiNii Articles
