Cu Pattern Etching by Oxygen Gas Cluster Ion Beams with Acetic Acid Vapor

Details 詳細情報について

• CRID

  1520290884824737792

• NII Article ID

  40021166649

• NDL BIB ID

  028116860

• Web Site

  http://id.ndl.go.jp/bib/028116860

  https://ndlsearch.ndl.go.jp/books/R000000004-I028116860

• Text Lang

  en

• NDL Source Classification

  • ZP5(科学技術--化学・化学工業--化学工学)

• Data Source

  • NDL
  • CiNii Articles