Influence of surrounding dielectrics on the data retention time of doped Sb2Te phase change material
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<jats:p> The crystallization properties of as-deposited and laser written amorphous marks of doped Sb<jats:sub>2</jats:sub>Te phase change material are found to be only dependent on the top dielectric layer. A ZnS:SiO<jats:sub>2</jats:sub> top dielectric layer yields a higher crystallization temperature and a larger crystal growth activation energy as compared to a SiO<jats:sub>2</jats:sub> top dielectric layer, leading to superior data retention times at ambient temperatures. The observed correlation between the larger crystallization temperatures and larger crystal growth activation energies indicates that the viscosity of the phase change material in the amorphous state is dependent on the interfacial energy between the phase change material and the top dielectric layer. </jats:p>
収録刊行物
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 50 (2), 024102-, 2011-02
Tokyo : The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1520572357568016512
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- NII論文ID
- 40018283313
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- NII書誌ID
- AA12295836
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- ISSN
- 00214922
- 13474065
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- NDL書誌ID
- 10981837
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- 本文言語コード
- en
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- NDL 雑誌分類
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- ZM35(科学技術--物理学)
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- データソース種別
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- NDL
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