Wave-cutoff method: theory, apparatus, characteristics, and applications

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  • Wave cutoff method theory apparatus characteristics and applications
  • Special issue: Plasma processing
  • Special issue Plasma processing

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<jats:p>In this paper, we present an overview of recent studies of the wave-cutoff method, so that researchers who are not familiar with it can use this method easily. This method uses a wave-cutoff probe to acquire plasma parameters from the transmission or reflection spectra of plasma. Since this method was developed, some applications and analysis methods have been attempted and much progress has been achieved. The wave-cutoff method can measure electron density and electron temperature simultaneously, and is usable even in processing plasma. This method can measure the plasma parameters very accurately in a very short time.</jats:p>

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