Residual strain evaluation by cross-sectional micro-reflectance spectroscopy of freestanding GaN grown by hydride vapor phase epitaxy

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Residual strain evaluation by cross sectional micro reflectance spectroscopy of freestanding GaN grown by hydride vapor phase epitaxy
Special issue: Advanced plasma science and its applications for nitrides and nanomaterials
Special issue Advanced plasma science and its applications for nitrides and nanomaterials

Japanese journal of applied physics : JJAP

Japanese journal of applied physics : JJAP 50 (1), 2011-01

Tokyo : The Japan Society of Applied Physics