Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching

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Ultimate Top down Etching Processes for Future Nanoscale Devices Advanced Neutral Beam Etching

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コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

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Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 45 (4A), 2395-2407, 2006-04

Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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ISSN: 00214922; 13474065; http://id.crossref.org/issn/13474065; http://id.crossref.org/issn/00214922

Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7882152; https://iopscience.iop.org/article/10.1143/JJAP.45.2395; https://iopscience.iop.org/article/10.1143/JJAP.45.2395/pdf

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