Selective synthesis of SiC and SiOx nanowires by direct microwave irradiation
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<jats:p> We report a facile and novel method for the selective growth of SiC and SiO<jats:sub> <jats:italic>x</jats:italic> </jats:sub> nanowires by direct microwave irradiation on a Si substrate under atmospheric pressure. Selective synthesis of the amorphous SiO<jats:sub> <jats:italic>x</jats:italic> </jats:sub> or crystalline SiC nanowires was achieved by varying the gas composition in the reactor. The proposed method requires a short reaction time (2 min) with no need for vacuum equipment because the reaction is carried out under atmospheric pressure. High-resolution transmission electron microscope images revealed that the SiO<jats:sub> <jats:italic>x</jats:italic> </jats:sub> nanowires were amorphous and that the SiC nanowires were crystalline. Raman spectra showed features typical of nano-sized SiC. On the basis of our results, we propose a growth mechanism of SiC and SiO<jats:sub> <jats:italic>x</jats:italic> </jats:sub> nanowires synthesized by direct microwave irradiation. </jats:p>
収録刊行物
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 50 (2), 025001-, 2011-02
Tokyo : The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1520853833061600384
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- NII論文ID
- 40018283319
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- NII書誌ID
- AA12295836
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- ISSN
- 00214922
- 13474065
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- NDL書誌ID
- 10981886
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- 本文言語コード
- en
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- NDL 雑誌分類
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- ZM35(科学技術--物理学)
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- データソース種別
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- NDL
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