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Crystal orientation of epitaxial α-Ta(110) thin films grown on Si(100) and Si(111) substrates by sputtering
Bibliographic Information
- Other Title
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- Crystal orientation of epitaxial アルファ Ta 110 thin films grown on Si 100 and Si 111 substrates by sputtering
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Description
資料形態 : テキストデータ プレーンテキスト
コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
Journal
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 47 (7), 5608-5612, 2008-07
Tokyo : The Japan Society of Applied Physics