Carbon-doped silicon oxide films with hydrocarbon network bonds for low-k dielectrics: theoretical investigations

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Carbon doped silicon oxide films with hydrocarbon network bonds for low k dielectrics theoretical investigations

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (9A), 5970-5974, 2007-09

Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics