Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H₂/O₂ Mixtures Activated on a Tungsten Hot-wire Catalyst
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収録刊行物
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- Journal of photopolymer science and technology
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Journal of photopolymer science and technology 34 (5), 499-504, 2021
Chiba : The Society of Photopolymer Science and Technology
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詳細情報 詳細情報について
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- CRID
- 1520854806242325248
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- NII論文ID
- 130008119601
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- NII書誌ID
- AA11576862
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- ISSN
- 09149244
- 13496336
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- NDL書誌ID
- 031669711
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- 本文言語コード
- en
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- NDL 雑誌分類
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- ZP48(科学技術--印写工学)
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- データソース種別
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- NDL
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