Surface Control of a Photoresponsive Self-Assembled Monolayer and Selective Deposition of Ag Nanoparticulate Ink
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説明
<jats:title>Abstract</jats:title> <jats:p>A highly hydrophobic self-assembled monolayer (SAM) with high photosensitivity to soft UV (λ = 365 nm) was formed on thermally surface-oxidized silicon wafers by a silane coupling agent bearing a 2-nitrobenzyl carbamate moiety. Very smooth SAM was obtained by the use of 1,3-bis(trifluoromethyl)benzene as a solvent. Photopatterning of the SAM was carried out by irradiation with soft UV at 2 J cm−2 (80 s) in acetone under a photomask. Selective deposition of Ag nanoparticulate ink by spin coating on the resulting patterned surface afforded a well-defined 10 µm line and space pattern. Subsequent photodeprotection to generate amino groups enabled the space regions to be selectively modified with fluorescent dye bearing a succinimidyl ester moiety.</jats:p>
収録刊行物
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- Bulletin of the Chemical Society of Japan
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Bulletin of the Chemical Society of Japan 89 (4), 424-429, 2016-04
Tokyo : Chemical Society of Japan
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詳細情報 詳細情報について
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- CRID
- 1522543655031671296
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- NII論文ID
- 130005144953
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- NII書誌ID
- AA00580132
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- ISSN
- 00092673
- 13480634
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- NDL書誌ID
- 027243242
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- 本文言語コード
- en
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- NDL 雑誌分類
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- ZP1(科学技術--化学・化学工業)
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- データソース種別
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- NDL
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