Joule-Heating-Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film
Bibliographic Information
- Other Title
-
- Joule Heating Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film
Search this article
Journal
-
- Japanese journal of applied physics. Part 2, Letters & express letters
-
Japanese journal of applied physics. Part 2, Letters & express letters 45 (42-45), L1142-1145, 2006-11
Tokyo : Japan Society of Applied Physics
- Tweet
Details 詳細情報について
-
- CRID
- 1524232503221630208
-
- NII Article ID
- 10018632275
-
- NII Book ID
- AA11906093
-
- ISSN
- 00214922
-
- NDL BIB ID
- 8548254
-
- Text Lang
- en
-
- NDL Source Classification
-
- ZM35(科学技術--物理学)
-
- Data Source
-
- NDL
- CiNii Articles
