Dependence of Electron Cyclotron Resonance plasma Characteristics on Magnetic Field Profiles : Etching :

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説明

Electron cyclotron resonance (ECR) plasma generation is influenced by the magnetic field profiles in ECR plasma. when an 875 G equimagnetic field and magnetic field gradient are nonuniform, the nonuniform plasma is generated around the ECR position (875 G position). Uneven plasma discharge causes ion acceleration and disturbs the ion flight directions due to the potential differences in ECR plasma. Therefore, a uniform magnetic field gradient at the ECR position and the flat 875 G equimagnetic field profile are necessary to achieve a precise pattern transfer without microloading effects.

収録刊行物

  • JJAP series

    JJAP series 5 192-198, 1992-04-30

    Japanese Journal of Applied Physics

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