Fabrication of LIGA Mask Based on a Silicon IC-Process

SUZUKI Kenichiro

Bibliographic Information

Other Title

半導体プロセスを用いたLIGAマスクの作製方法

Description

A well-defined x-ray mask which consists of a set of 10μm thick gold absorber patterns and a membrane with a low tensile stress is required for LIGA process. We have fabricated a LIGA mask by using a silicon IC-process, while paying a careful attention on dust and contamination problems occurred during the process. In the paper, polysilicon stress control and fabrication of gold absorber patterns with a high aspect ratio are described in details.

Journal

IEICE technical report. EMD

IEICE technical report. EMD 97 (12), 19-24, 1997-04-18

The Institute of Electronics, Information and Communication Engineers

Keywords

Details 詳細情報について

CRID: 1570009752433769984

NII Article ID: 110003293080

NII Book ID: AN10383978

Text Lang: ja

Data Source

CiNii Articles

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