Damage to YBa2Cu3Oy Surface Caused by Ar Ion Beam Etching.

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  • Matsui Toshiyuki
    Euji Electric Corporate Research and Development, Ltd., 2–2–1 Nagasaka, Yokosuka 240–01, Japan
  • Yamaguchi Dabide
    Euji Electric Corporate Research and Development, Ltd., 2–2–1 Nagasaka, Yokosuka 240–01, Japan
  • Kamijo Hiroshi
    Euji Electric Corporate Research and Development, Ltd., 2–2–1 Nagasaka, Yokosuka 240–01, Japan

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  • Damage to YBa<sub>2</sub>Cu<sub>3</sub>O<sub>y</sub> Surface Caused by Ar Ion Beam Etching

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We studied transport properties through a YBa2Cu3Oy (YBCO) surface etched by exposure of the YBCO surface to an Ar ion beam. In layered junctions of Au/(100)-oriented YBCO with the etched surface, Poole-Frenkel emission was detected by analyzing current-voltage curves. This suggests that a relatively thick insulating layer was formed on the YBCO surface by damage resulting from the Ar ion beam etching.

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