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Improvement of Aluminum-Si Contact Performance in Native-Oxide-Free Processing
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Journal
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- IEEE Electron Device Letters
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IEEE Electron Device Letters 11 (10), 448-450, 1990
Institute of Electrical and Electronics Engineers
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Details 詳細情報について
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- CRID
- 1570291227681257728
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- NII Article ID
- 120002338864
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- ISSN
- 07413106
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- Web Site
- http://hdl.handle.net/10097/47982
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- Text Lang
- en
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- Data Source
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- CiNii Articles
