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Phonon-Induced Transverse Relaxation in LaF<SUB>3</SUB>:Pr<SUP>3+</SUP> Measured by Photon Echoes
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- Kohmoto Toshiro
- Department of Physics, Faculty of Science, Kyoto University
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- Nakatsuka Hiroki
- Department of Physics, Faculty of Science, Kyoto University
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- Matsuoka Masahiro
- Department of Physics, Faculty of Science, Kyoto University
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Description
Temperature dependences of backward photon echo intensity have been measured from 5°K to 13°K on the 3P0–3H4 (4778 Å) and 1D2–3H4 (5925 Å) transitions of LaF3:Pr3+. Over six orders of magnitude (on the 3P0–3H4 transition) and three orders of magnitude (on the 1D2–3H4 transition) of the photon echo intensity, the experimental results are explained by the one-phonon process (the direct process) taking into account the energy differences between the echo levels and their adjacent levels. Preliminary measurements have also been made on the 4G7⁄2–4I9⁄2 (5221 Å) and 4G5⁄2–4I9⁄2 (5775 Å) transitions of LaF3:Nd3+.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 22 (9), L571-L573, 1983
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1571135652313373952
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- NII Article ID
- 110003929291
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- NII Book ID
- AA10650595
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- Text Lang
- en
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- Data Source
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- CiNii Articles
