A Technology for Suppressing Inter-Layer Dielectric Crack in a High Density DRAM
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- KIM B. C.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- KIM D. H.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- HUH W. K
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- BAE M. K.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- NAM J. W.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- LEE S. C.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- KIM J. S.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- KIM T. K.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- PARK Y. J.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- PARK J. S.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- KIM K. N.
- Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2001 188-189, 2001-09-25
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- CRID
- 1571698600116109952
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- NII論文ID
- 10015752621
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- NII書誌ID
- AA10777858
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