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A 0.54μm^2 Self-Aligned, HSG Floating Gate Cell (SAHF Cell) for 256Mbit Flash Memories
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- SHIRAI H.
- NEC Corporation
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- KUBOTA T.
- NEC Corporation
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- HONMA I.
- NEC Corporation
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- WATANABE H.
- NEC Corporation
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- ONO H.
- NEC Corporation
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- OKAZAWA T.
- NEC Corporation
Bibliographic Information
- Other Title
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- 256Mフラッシュメモリ用0.54μm^2 SAHF (Self-Aligned HSG Floating gate) セル
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Description
A 0.54μm^2 Self-Aligned memory cell with Hemispherical-grained (HSG) poly-Si Floating gate (SAHF cell) has been developed for 256Mbit flash memories. Applying hemispherical-grained (HSG) poly-Si to floating gate extends the upper surface area double that of the floating gate in comparison with the conventional ones. A high capacitive-coupling ratio of 0.8 and buried n^+ diffusion layers which are self-aligned to the floating gate poly-Si are realized simultaneously with a simple cell structure and fewer process steps.
Journal
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- Technical report of IEICE. SDM
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Technical report of IEICE. SDM 96 (63), 69-76, 1996-05-23
The Institute of Electronics, Information and Communication Engineers
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Keywords
Details 詳細情報について
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- CRID
- 1571698602396228736
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- NII Article ID
- 110003309680
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- NII Book ID
- AN10013254
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- Text Lang
- ja
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- Data Source
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- CiNii Articles