Plasma Cure Process for Porous SiOCH Films using CF_4 Gas
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- TOMIOKA Kazuhiro
- Semiconductor Leading Edge Technologies, Inc. (Selete)
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- NAKAHIRA Junya
- Semiconductor Leading Edge Technologies, Inc. (Selete)
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- KONDO Seiichi
- Semiconductor Leading Edge Technologies, Inc. (Selete)
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- OGAWA Shinichi
- Semiconductor Leading Edge Technologies, Inc. (Selete)
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- SAITO Shuichi
- Semiconductor Leading Edge Technologies, Inc. (Selete)
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2007 266-267, 2007-09-19
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詳細情報 詳細情報について
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- CRID
- 1571980075555939328
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- NII論文ID
- 10022548801
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- NII書誌ID
- AA10777858
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- 本文言語コード
- en
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- データソース種別
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