A Minimization Scheme for a period of Process Simulator Development in TCAD : Development of Simulation Standard Libraries and an Application
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- NAKAMURA Mitsutoshi
- Microelectronics Engineering Laboratory, TOSHIBA Corporation
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- NAKAUCHI Takahiro
- Semiconductor DA & Test Engineering Center, TOSHIBA Corporation
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- FUKUDA Toshikazu
- Semiconductor DA & Test Engineering Center, TOSHIBA Corporation
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- KUSUNOKI Naoki
- Microelectronics Engineering Laboratory, TOSHIBA Corporation
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- KANEMURA Takahisa
- Microelectronics Engineering Laboratory, TOSHIBA Corporation
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- FUKUDA Sanae
- Microelectronics Engineering Laboratory, TOSHIBA Corporation
Bibliographic Information
- Other Title
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- TCADを構成するプロセスシミュレータの開発期間短縮手法の提案 : 標準ライブラリの開発とそれを用いた汎用プロセスシミュレータ
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Description
TCAD has been expected to become a useful tool for minimizing a period of device development, and faster development of simulator is strongly demanded to fulfill the expectation. We have developed standard software libraries first, and then constructed a process simulator using these libraries as its parts. These libraries make it possible to shorten the development period. In this paper, We mainly describe about a geometry library which is one of the most important in process simulator.
Journal
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- Technical report of IEICE. VLD
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Technical report of IEICE. VLD 97 (268), 79-86, 1997-09-25
The Institute of Electronics, Information and Communication Engineers
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Keywords
Details 詳細情報について
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- CRID
- 1572261552245876864
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- NII Article ID
- 110003294487
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- NII Book ID
- AN10013323
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- Text Lang
- ja
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- Data Source
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- CiNii Articles