High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure
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- KAKIUCHI Hiroaki
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- OHMI Hiromasa
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- KUWAHARA Yasuhito
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- MATSUMOTO Mitsuhiro
- SANYO Electric Co., Ltd.
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- EBATA Yusuke
- SHARP Co., Ltd.
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- YASUTAKE Kiyoshi
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- YOSHII Kumayasu
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- MORI Yuzo
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2005 758-759, 2005-09-13
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詳細情報 詳細情報について
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- CRID
- 1572824500485245568
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- NII論文ID
- 10022543153
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- NII書誌ID
- AA10777858
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- 本文言語コード
- en
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- データソース種別
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