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Analysis of Propagation Delay Time for Double-gate SOI-MOSFETs Based on a Scaling Theory
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- Tosaka Yoshiharu
- Fujitsu Laboratories Ltd.
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- Suzuki Kunihiro
- Fujitsu Laboratories Ltd.
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- Sugii Toshihiro
- Fujitsu Laboratories Ltd.
Bibliographic Information
- Other Title
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- ダブルゲートSOI-MOSFETのスケーリング理論に基づく伝搬遅延時間の解析
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Description
Using our scaling theory we estimated propagation delay time(t_ pd>)for scaled down doublegate(DG)SOI-MOSFETs with an ideal subthreshold factor.We implemented a mobility model,which we derived to agree with experimental data for DGSOI-MOSFETs,on a mixed-level device-circuit simulator and estimated t_pd>.The estimated t_pd> values of 6.2 ps for L_G = O.1μm and 3.4 ps for 0 .05μm show that DGSOI-MOSFETs overcome the scaling limits of bulk MOSFETs and display superb device performance.
Journal
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- IEICE technical report. Electron devices
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IEICE technical report. Electron devices 93 (217), 1-6, 1993-09-17
The Institute of Electronics, Information and Communication Engineers
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Keywords
Details 詳細情報について
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- CRID
- 1573387452170332544
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- NII Article ID
- 110003200353
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- NII Book ID
- AN10012954
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- Text Lang
- ja
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- Data Source
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- CiNii Articles