Soflness of Co-Fe based films with high crystallographic orientation
-
- Ohsawa Yuichi
- R&D center Toshiba
-
- Iwasaki Hitoshi
- R&D center Toshiba
-
- Akashi Reiko
- R&D center Toshiba
Bibliographic Information
- Other Title
-
- 高配向CoFe系膜の軟磁性
Search this article
Description
Relationship between crystallographic orientation and softness of sputtered Co_90>Fe_10> based films was investigated.Sputtered Co_90>Fe_10> films showed a high Hc of more than sevaral hundreds A, m and mixed phases of fcc and hcp with weak crystallographic orientation.The addition of 2 at.% AI or 8 at.% Ta improved the softness of Co_90>Fe_10> films.The softness improvement for the AI addition was related to the growth of an fcc phase(111)preferred orientation,while that for the Ta addition was related to the growth of an hcp phase(001)preferred orientation.
Journal
-
- IEICE technical report. Magnetic recording
-
IEICE technical report. Magnetic recording 93 (236), 1-6, 1993-09-17
The Institute of Electronics, Information and Communication Engineers
- Tweet
Details 詳細情報について
-
- CRID
- 1573668927173886080
-
- NII Article ID
- 110003186264
-
- NII Book ID
- AN10013050
-
- Text Lang
- ja
-
- Data Source
-
- CiNii Articles