A Highly Scalable Split-Gate SONOS Flash Memory with Programmable-Pass and Pure-Select Transistors for Sub-90-nm Technology

  • LEE Yong Kyu
    Inter-university Semiconductor Research Center and School of Electrical Engineering, Seoul National University
  • CHOI Byung Yong
    Inter-university Semiconductor Research Center and School of Electrical Engineering, Seoul National University
  • SIM Jae Sung
    Inter-university Semiconductor Research Center and School of Electrical Engineering, Seoul National University
  • SONG Ki Whan
    Inter-university Semiconductor Research Center and School of Electrical Engineering, Seoul National University
  • LEE Jong Duk
    Inter-university Semiconductor Research Center and School of Electrical Engineering, Seoul National University
  • PARK Byung-Gook
    Inter-university Semiconductor Research Center and School of Electrical Engineering, Seoul National University
  • PARK Donggun
    Device Research Team, R&D Center, Samsung Electronics Co.
  • CHUNG Chilhee
    C&M, System LSI, Samsung Electronics Co.

この論文をさがす

収録刊行物

参考文献 (3)*注記

もっと見る

詳細情報 詳細情報について

  • CRID
    1574231875355700352
  • NII論文ID
    10022538390
  • NII書誌ID
    AA10777858
  • 本文言語コード
    en
  • データソース種別
    • CiNii Articles

問題の指摘

ページトップへ