Effect Of Starting Interface in Scalability/Device Performance of Ultra-Scaled ALD HfSiON/TiN Gate Stacks
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- QUEVEDO-LOPEZ M. A.
- Texas Instruments
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- KRISHNAN S. A.
- SEMATECH
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- KIRSCH P. D.
- IBM
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- PETERSON J.
- SEMATECH
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- LI H.-J
- Infineon
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- KIM M.
- University of Texas at Dallas
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- HUFFMAN C.
- Texas Instruments
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2005 494-495, 2005-09-13
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- CRID
- 1574231875369436288
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- NII論文ID
- 10022542344
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- NII書誌ID
- AA10777858
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles
