155 フォーカルプレーンシャッターにおける露光ムラを抑制するための設計因子の検討

書誌事項

タイトル別名
  • 155 Examination of Design Factor for Suppression of Unevenness Exposure with regards to Focal-plane shutter

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説明

The shutter of camera is a device that controls exposure time for the image sensor. A focal-plain-shutter is currently mainstream model of SLR Camera. The uneven-exposure is rarely occur at the manufacturing stage in the focal-plain-shutter. The uneven-exposure is phenomenon that photographs isn't able to be exposed. The unevenness-exposure cause is vibration of the shutter-blades. The cause of vibration is the gap between the shutter blades and pins. To reveal cause of the uneven-exposure, this study focuses on the backlash of arm with drive-unit. This study uses shutter-blades model for simple experiment. The experimental apparatus can drive the shutter-blade model with slider at high speed by spring force. To reveal the behavior during transient moving, two laser-displacement-meters measure the displacement gap of shutter-blade-model and slider. The results or experiments, it become clear that center of gravity and backlash size of shutter-blades model are important parameters. Rebound amount and interval time of peak to peak decrees as the backlash is decrees.

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詳細情報 詳細情報について

  • CRID
    1574231877227044608
  • NII論文ID
    110010051778
  • NII書誌ID
    AA11901770
  • ISSN
    13480235
  • 本文言語コード
    ja
  • データソース種別
    • CiNii Articles

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