<title>Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits</title>

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The principles and techniques of writing various types of micro gratings directly on chalcogenide (As2S3) film waveguides using the electron beam are reviewed. A computer-controlled apparatus has been developed so that we can fabricate any gratings of uniform/ chirped periods with slant lines which have the area of the order of 1 mm2, the diffraction efficiency of nearly 100 %, and the minimum grating period of 0.2 µm. Combination of those micro gratings results in integrated grating circuits (IGC). An IGC for guided-beam multiple division has been successfully fabricated.© (1981) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

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