Photodissociation of Chlorine on a Cooled Silicon Wafer

DOI

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説明

<jats:p>Laser irradiation at 193 nm of multilayered Cl<jats:sub>2</jats:sub> on an Si wafer cooled to 100 K leads to both photodissociation of Cl<jats:sub>2</jats:sub> and formation of photoetching products.</jats:p>

収録刊行物

  • MRS Proceedings

    MRS Proceedings 129 1988-01-01

    Springer Science and Business Media LLC

詳細情報 詳細情報について

  • CRID
    1870020693289066112
  • DOI
    10.1557/proc-129-305
  • ISSN
    19464274
    02729172
  • データソース種別
    • OpenAIRE

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