Nano-gap fabrication by focused ion beam for DNA trapping

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Description

Micromachined tweezers having nanometer sized gap was fabricated with a silicon isotropic etching method and a focused ion beam technique. The gap of tweezers fabricated by this process was accomplished to be 15 nm-2 ?m ranges. The validity of this tweezers was demonstrated by trapping DNA molecules. Trapping of bundle of ?-DNA molecules between 100 ?m gap was succeeded.

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