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Optical isolator using a nonreciprocal phase shift with a semiconductor guiding layer
Description
An optical isolator composed of a semiconductor guiding layer is studied. The isolator employing a nonreciprocal phase shift was fabricated by using wafer bonding technique. The nonreciprocal phase shift was measured in the fabricated device.
Journal
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- LEOS 2000. 2000 IEEE Annual Meeting Conference Proceedings. 13th Annual Meeting. IEEE Lasers and Electro-Optics Society 2000 Annual Meeting (Cat. No.00CH37080)
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LEOS 2000. 2000 IEEE Annual Meeting Conference Proceedings. 13th Annual Meeting. IEEE Lasers and Electro-Optics Society 2000 Annual Meeting (Cat. No.00CH37080) 2 700-701, 2002-11-08
IEEE
