Optical-field-induced ionization x-ray laser studies using a preformed plasma
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説明
Soft x-ray amplification by optical-field-induced ionization (OFI) of a preformed plasma is investigated. Experimental and numerical results ensure that we have produced a plasma with a significantly lower electron temperature than what is expected by an above-threshold ionization model. In order to explain the results, a two-component plasma model in which relatively high temperature electrons are produced by OFI in a cold electron bath of the preformed plasma is presented. The model indicates that the average electron temperature of the OFI plasma rapidly decreases since a high-temperature part of the electrons escapes from the focal volume without interaction. The initial electrons produced prior to the field ionization which survive after the OFI also significantly contribute to the rapid three-body recombination. Based on the ionization-induced refractive-index change, the pulse propagation of a high-intensity pump laser during the OFI is also discussed.
収録刊行物
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- SPIE Proceedings
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SPIE Proceedings 2520 84-, 1995-09-25
SPIE
