Textured ZnO:Al films for solar cells by DC-magnetron sputtering in water vapor plasma
説明
The successful production of low-resistive textured ZnO:Al films for solar cells by DC magnetron sputtering is discussed. The surface morphology and grain structure were strongly affected by the addition of water vapor during sputtering. Low-resistive pyramidical textured ZnO:Al films were deposited onto glass substrates in the presence of water vapor at 300-400 degrees C. The 2 mu m thick films possessed a sheet resistance of 9 Omega / Square Operator and an optical transmission of 80% at 550 nm after annealing in a vacuum. The textured/flat-surface ZnO:Al bilayers with sheet resistance of 4 Omega / Square Operator were also obtained. >
収録刊行物
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- The Conference Record of the Twenty-Second IEEE Photovoltaic Specialists Conference - 1991
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The Conference Record of the Twenty-Second IEEE Photovoltaic Specialists Conference - 1991 1389-1392, 2002-12-09
IEEE