21.1: A 513‐ppi FFS‐Mode TFT‐LCD using CAAC Oxide Semiconductor Fabricated by a 6‐Mask Proces
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<jats:title>Abstract</jats:title><jats:p>A driving method which does not need planarity for high definition and enables low frequency driving was examined. Further, a 513‐ppi FFS‐mode liquid crystal display (LCD) panel with high aperture ratio was fabricated via a six‐mask process, using a technique that combines an oxide semiconductor and an oxide conductor.</jats:p>
収録刊行物
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- SID Symposium Digest of Technical Papers
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SID Symposium Digest of Technical Papers 45 263-266, 2014-06-01
Wiley