A reliable bi-polarity write/erase technology in flash EEPROMs
説明
The authors describe a technology for scaling down the flash EEPROM cell, which has a conventional self-aligned double poly-Si stacked structure. It is clarified experimentally that a flash memory cell written and erased by Fowler-Nordheim (F-N) tunneling has ten times the retention time of the conventional cell, which is written by channel-hot-electron (CHE) injection and erased by F-N tunneling. This difference of data retentivity between these two write/erase (W/E) technologies is due to decreasing the thin gate oxide leakage current by bi-polarity F-N tunneling stress. This improvement in data retention becomes more pronounced as the gate oxide thickness decreases. Therefore, a bipolarity F-N tunneling WE technology, which enables a flash EEPROM cell to scale down its oxide thickness, shows promise as a key technology for realizing 16 Mb flash EEPROMs and beyond. >
収録刊行物
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- International Technical Digest on Electron Devices
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International Technical Digest on Electron Devices 111-114, 2002-12-04
IEEE