Fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate
説明
In this paper we study about the fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate.
収録刊行物
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- Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference
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Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference 86-87, 2004-05-06
Japan Soc. of Appl. Phys
