Ionization-assisted deposition of alkylacrylate and fluorinated alkylacrylate polymer thin films
説明
Polymeric thin films were prepared by the ionization-assisted deposition (IAD) from alkylacrylate source materials. Deposition of n-octadecyl acrylate resulted in formation of comb-like acryl polymer having long alkyl side chain. The polymer yield increased with increasing electron emission current for the IAD. For the preparation of fluorinated polymer thin films, 1H,1H,11H-eicosafluoroundecyl acrylate was used as the source material. While no films were obtained by the conventional evaporation method, insoluble thin films were deposited by the IAD. The deposited film had Teflon/sup R/-like feature of large water contact angle.
収録刊行物
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- Proceedings of the 7th International Conference on Properties and Applications of Dielectric Materials (Cat. No.03CH37417)
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Proceedings of the 7th International Conference on Properties and Applications of Dielectric Materials (Cat. No.03CH37417) 1 104-107, 2004-05-13
IEEE