A high aperture and high density a-Si TFT-LCD with a new pixel structure
説明
The authors have developed a TFT-LCD with new pixel structure which enhances aperture ratio. The new structure has a transparent electrode between the signal line and the pixel electrode, which shields the capacitive coupling between the signal line and the pixel electrode and reduces the liquid crystal disclination lines caused by the transverse electric field between them. A high aperture ratio of 40% has been achieved on a 40 /spl mu/m square pixel, which is the largest value for this size of a-Si TFT-LCD. >
収録刊行物
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- Proceedings of IEEE International Electron Devices Meeting
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Proceedings of IEEE International Electron Devices Meeting 401-404, 2002-12-30
IEEE