Epitaxial Growth of 3C-SiC on T-shape columnar Si Substrates

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<jats:title>Abstract</jats:title><jats:p>Cubic silicon carbide (3C-SiC) is a suitable semiconductor material for high temperature, high power and high frequency electronic devices, because of its wide bandgap, high electron mobility and high saturated electron drift velocity. The usage of Si substrates has the advantage of large area substrates for the growth of 3C-SiC layers. However, large lattice mismatch between 3C-SiC and Si (>20%) has caused the generation of defects such as misfit dislocations, twins, stacking faults and threading dislocations at the SiC/Si interface. Lateral epitaxial overgrowth (ELOG) of 3C-SiC on Si substrates using SiO<jats:sub>2</jats:sub> has been reported to reduce the defect density. In this report, epitaxial growth of 3C-SiC on T-shape patterned (100) Si substrates has been investigated to reduce interfacial defects.</jats:p>

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  • MRS Proceedings

    MRS Proceedings 815 2004-01-01

    Springer Science and Business Media LLC

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