Synthesis of InN by N+ implantation on InP at high temperature

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Abstract Hexagonal phase InN was synthesized by 50 keV nitrogen ion implantation at 400 °C on an (1 0 0) InP single crystal substrate. The implanted samples were characterised using glancing incidence X-ray diffraction (GIXRD) and Raman spectroscopy. At low implantation dose the metallic In is observed to form due to the implantation-induced decomposition of the InP at 400 °C. As the implantation dose is increased complete nitradation takes place resulting in the disappearance of the metallic indium and formation of InN phase.

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