Resolution enhancement of EUV microscope using an EUV beam splitter
説明
Extreme ultraviolet lithography (EUVL) has been proposed as a next generation lithography. In this paper, EUV phase-shift microscope was developed to detect phase defect in multilayer mask and EUV beam splitter is also developed, which is critical component of phase-shift inspection or resolution enhancement.
収録刊行物
-
- 2007 Digest of papers Microprocesses and Nanotechnology
-
2007 Digest of papers Microprocesses and Nanotechnology 400-401, 2007-11-01
IEEE