Two- and three-Dimensional Refractive Index Lattices Formed by Laterally Patterned Porous Silicon Layers
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説明
<jats:title>Abstract</jats:title><jats:p>Porous silicon was used to fabricate refractive index lattices. Patterned n-doping and/ or substrate etching were used to introduce lateral periodicity. By anodizing p-type substrate with an n-doped area, we realized large refractive index contrast two-dimensional lattices with underlying cladding layer. The anodization process showed an effect specific to the small dimensional patterning and this effect has significant influence on the formed refractive index structure.</jats:p>
収録刊行物
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- MRS Proceedings
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MRS Proceedings 597 1999-01-01
Springer Science and Business Media LLC