LaB6 coating to reduce the outgassing rate of a vacuum wall

説明

Abstract Use of LaB6 is proposed to develop a low outgassing wall for vacuum chambers in which baking is not possible. Sputter deposition of LaB6 was performed in a device equipped with a d.c. plasma source, and the pumping characteristics of the chamber were investigated before and after depositioning the LaB6 coating onto the wall. The chamber with the LaB6 coating reached a lower ultimate pressure than that without the coating, and the residual water vapor pressure was remarkably reduced with the coating. The pumping speed on the coated surface was estimated to be 0.45 1 s−1 cm−2.

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