Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source
説明
The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.
収録刊行物
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- 2009 Conference on Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics
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2009 Conference on Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics 1-2, 2009-08-01
IEEE