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Deposition of GaN Films on Glass Substrate and Its Application to UV Electroluminescent Devices
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Description
<jats:title>Abstract</jats:title><jats:p>GaN films were deposited on glass substrates using a compound-source molecular beam epitaxy technique. Electroluminescent devices with a double-insulator structure were also fabricated using the deposited films. When the devices were operated using a sine-wave voltage, one of the emission peaks was located in the UV spectral region. Introducing a small ammonia flow increased the deposition rate.</jats:p>
Journal
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- MRS Proceedings
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MRS Proceedings 743 2002-01-01
Springer Science and Business Media LLC
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Details 詳細情報について
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- CRID
- 1872553967982463488
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- ISSN
- 19464274
- 02729172
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- Data Source
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- OpenAIRE